PERPENDICULAR GIANT MAGNETORESISTANCE OF MICROSTRUCTURES IN FE-CR AND CO-CU MULTILAYERS

被引：37

作者：

GIJS, MAM ^{[1
]}

GIESBERS, JB ^{[1
]}

JOHNSON, MT ^{[1
]}

DESTEGGE, JBFA ^{[1
]}

LENCZOWSKI, SKJ ^{[1
]}

VANDEVEERDONK, RJM ^{[1
]}

DEJONGE, WJM ^{[1
]}

机构：

[1] EINDHOVEN UNIV TECHNOL,DEPT PHYS,5600 MB EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF APPLIED PHYSICS | 1994年 / 75卷 / 10期

关键词：

D O I：

10.1063/1.356847

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We discuss the fabrication and microstructuring techniques of pillar structures made of high vacuum sputtered Fe/Cr multilayers and of molecular beam epitaxy evaporated Co/Cu multilayers, for which we measured the giant magnetoresistance effect with the current perpendicular to the multilayer plane from 4 K to 300 K. Using optical lithography and reactive ion etching techniques we obtained structures with a typical height of 0.5 mum and a width ranging between 3 and 10 mum. For both Fe/Cr and Co/Cu multilayers we find an enhanced magnetoresistance with respect to the in-plane case. The perpendicular magnetoresistance of the Fe/Cr pillars strongly decreases with temperature, while for the Co/Cu samples the temperature dependence is weaker, indicating electron-magnon scattering processes of different strength.

引用

页码：6709 / 6713

页数：5

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