LOW-VOLTAGE TRIODE SPUTTERING AND BACKSPUTTERING WITH A CONFINED PLASMA .4. HEAT-TRANSFER CHARACTERISTICS

被引:10
作者
NEVIS, BE [1 ]
TISONE, TC [1 ]
机构
[1] BELL TEL LABS INC,ALLENTOWN,PA 18103
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 06期
关键词
D O I
10.1116/1.1318705
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1177 / 1185
页数:9
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  • [1] LOW-VOLTAGE TRIODE SPUTTERING WITH A CONFINED PLASMA .1. GEOMETRIC ASPECTS OF DEPOSITION
    TISONE, TC
    BINDELL, JB
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (02): : 519 - 527
  • [2] TISONE TC, PRIVATE COMMUNICATIO
  • [3] [No title captured]