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LOW-VOLTAGE TRIODE SPUTTERING AND BACKSPUTTERING WITH A CONFINED PLASMA .4. HEAT-TRANSFER CHARACTERISTICS
被引:10
作者
:
NEVIS, BE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
NEVIS, BE
[
1
]
TISONE, TC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
TISONE, TC
[
1
]
机构
:
[1]
BELL TEL LABS INC,ALLENTOWN,PA 18103
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
|
1974年
/ 11卷
/ 06期
关键词
:
D O I
:
10.1116/1.1318705
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1177 / 1185
页数:9
相关论文
共 3 条
[1]
LOW-VOLTAGE TRIODE SPUTTERING WITH A CONFINED PLASMA .1. GEOMETRIC ASPECTS OF DEPOSITION
TISONE, TC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
TISONE, TC
BINDELL, JB
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
BINDELL, JB
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1974,
11
(02):
: 519
-
527
[2]
TISONE TC, PRIVATE COMMUNICATIO
[3]
[No title captured]
←
1
→
共 3 条
[1]
LOW-VOLTAGE TRIODE SPUTTERING WITH A CONFINED PLASMA .1. GEOMETRIC ASPECTS OF DEPOSITION
TISONE, TC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
TISONE, TC
BINDELL, JB
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
BINDELL, JB
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1974,
11
(02):
: 519
-
527
[2]
TISONE TC, PRIVATE COMMUNICATIO
[3]
[No title captured]
←
1
→