HIGH-ASPECT-RATIO LINE FOCUS AND PLASMA PRODUCTION USING A RANDOM PHASE PLATE

被引：4

作者：

DESSELBERGER, M ^{[1
]}

GIZZI, L ^{[1
]}

BARROW, V ^{[1
]}

EDWARDS, J ^{[1
]}

KHATTAK, F ^{[1
]}

VIANA, S ^{[1
]}

WILLI, O ^{[1
]}

DANSON, CN ^{[1
]}

机构：

[1] RUTHERFORD APPLETON LAB,DIDCOT OX11 0QX,OXON,ENGLAND

来源：

APPLIED OPTICS | 1992年 / 31卷 / 19期

关键词：

D O I：

10.1364/AO.31.003759

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The use of rectangular-element random phase plates to generate a line focus is described- Photographic records of the resultant focus are presented and compared with theoretical calculations made by using an interference code. Good agreement is found. The code is used to investigate possible design modifications to produce a more square-topped line focus. A 12-ps Raman-shifted KrF (lambda = 0.268-mu-m) laser pulse is used in combination with such plates to produce a laser plasma. The plasma conditions are extensively characterized by using time-resolved extreme UV spectroscopy and a pinhole camera, and their suitability for x-ray laser applications is discussed.

引用

页码：3759 / 3766

页数：8

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