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WET CHEMICAL PASSIVATION OF YBA2CU3O7-X
被引:7
作者:
VASQUEZ, RP
HUNT, BD
FOOTE, MC
机构:
[1] Center for Space Microelectronics Technology, Jet Propulsion Laboratory, California Institute of Technology, Pasadena
关键词:
D O I:
10.1149/1.2086940
中图分类号:
O646 [电化学、电解、磁化学];
学科分类号:
081704 ;
摘要:
Wet chemical techniques are described for treatment of YBa2Cu3O7-x surfaces, which result in the formation of native compounds known to have little or no reactivity to water. Suitable native compounds include CuI, BaSO4, CuS, Cu2S, YF3, and the oxalates. Formation of surface layers in which these nonreactive native compounds are major constituents is verified with x-ray photoelectron spectroscopy (XPS) measurements on YBa2Cu3O7-x films treated with dilute solutions of HI, H2SO4, Na2S, HF, or H2C2O4. No significant changes are observed in the XPS spectra when the sulfide, sulfate, or oxalate films are dipped in water, while the iodide and fluoride films show evidence of reaction with water. X-ray diffraction measurements show that the superconducting phase is absent in the sulfide film, but is unaffected by the oxalate and sulfate treatments. © 1990, The Electrochemical Society, Inc. All rights reserved.
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页码:2344 / 2350
页数:7
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