RECENT ADVANCES IN THERMOMETRY BELOW 300 MK

被引：46

作者：

HUDSON, RP ^{[1
]}

MARSHAK, H ^{[1
]}

SOULEN, RJ ^{[1
]}

UTTON, DB ^{[1
]}

机构：

[1] NATL BUR STAND, INST BASIC STAND, HEAT DIV, WASHINGTON, DC 20234 USA

来源：

JOURNAL OF LOW TEMPERATURE PHYSICS | 1975年 / 20卷 / 1-2期

关键词：

D O I：

10.1007/BF00115257

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1 / 102

页数：102

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