ON THE PHOTOREACTIVITY OF DIACETYLENE CONTAINING THERMOPLASTIC BLOCK COPOLYMERS

被引：29

作者：

LIANG, RC

REISER, A

机构：

[1] Polytechnic Inst of New York, NY, USA, Polytechnic Inst of New York, NY, USA

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1987年 / 25卷 / 02期

关键词：

DIACETYLENES - MONOMER REACTIVITY - PHASE SEPARATION - THERMOPLASTIC BLOCK COPOLYMERS;

D O I：

10.1002/pola.1987.080250202

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

(Edited Abstract)

引用

收藏

页码：451 / 465

页数：15

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