HIGH SILICA WAVE-GUIDES ON ALUMINA SUBSTRATES FOR HYBRID OPTOELECTRONIC INTEGRATION

被引：6

作者：

SUN, CJ ^{[1
]}

MYERS, WM ^{[1
]}

SCHMIDT, KM ^{[1
]}

SUMIDA, S ^{[1
]}

JACKSON, KP ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 1992年 / 4卷 / 06期

关键词：

D O I：

10.1109/68.141991

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

High silica optical waveguides are fabricated on alumina substrates by flame hydrolysis deposition (FHD) and reactive ion etching (RIE) patterning techniques. The composition of the high silica glass waveguides is adjusted from that of the conventional FHD glass to reduce the thermal expansion mismatch between silica glass and alumina. Thus made glass waveguides exhibit low loss and are compatible with various types of alumina ceramic substrates.

引用

页码：630 / 632

页数：3

共 11 条

[1] POLYMER MICROSTRUCTURE WAVE-GUIDES ON ALUMINA AND BERYLLIUM-OXIDE SUBSTRATES FOR OPTICAL INTERCONNECTION [J].