ROOM-TEMPERATURE OXIDATION OF LEAD-INDIUM ALLOY-FILMS

被引：19

作者：

ELDRIDGE, JM ^{[1
]}

DONG, DW ^{[1
]}

KOMAREK, KL ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95193

来源：

关键词：

D O I：

10.1007/BF02660316

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1191 / 1205

页数：15

共 20 条

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[3] CHOU NJ, TO BE PUBLISHED
[4] GROWTH OF THIN PBO LAYERS ON LEAD FILMS .1. EXPERIMENT
ELDRIDGE, JM
DONG, DW
[J]. SURFACE SCIENCE, 1973, 40 (03) : 512 - 530
[5] ANALYSIS OF ULTRATHIN OXIDE GROWTH ON INDIUM
ELDRIDGE, JM
VANDERME.YJ
DONG, DW
[J]. THIN SOLID FILMS, 1972, 12 (02) : 447 - &
[6] ELDRIDGE JM, TO BE PUBLISHED
[7] MOTT-CABRERA OXIDATION RATE EQUATION AND INVERSE-LOGARITHMIC LAW
GHEZ, R
[J]. JOURNAL OF CHEMICAL PHYSICS, 1973, 58 (05) : 1838 - 1843
[8] GHEZ R, COMMUNICATION
[9] GRUHL W, 1949, Z METALLKD, V40, P225
[10] Hauffe K., 1965, OXID MET