学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
EVALUATION OF THE PHOSPHORUS CONCENTRATION AND ITS EFFECT ON VISCOUS-FLOW AND REFLOW IN PHOSPHOSILICATE GLASS
被引:20
作者
:
LEVY, RA
论文数:
0
引用数:
0
h-index:
0
LEVY, RA
VINCENT, SM
论文数:
0
引用数:
0
h-index:
0
VINCENT, SM
MCGAHAN, TE
论文数:
0
引用数:
0
h-index:
0
MCGAHAN, TE
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1985年
/ 132卷
/ 06期
关键词
:
D O I
:
10.1149/1.2114146
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:1472 / 1480
页数:9
相关论文
共 32 条
[1]
MEASURING THE PHOSPHORUS CONCENTRATION IN DEPOSITED PHOSPHOSILICATE FILMS
ADAMS, AC
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
ADAMS, AC
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
MURARKA, SP
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(02)
: 334
-
338
[2]
SCANNING ELECTRON-MICROSCOPE INVESTIGATION OF GLASS FLOW IN MOS INTEGRATED-CIRCUIT FABRICATION
ARMSTRONG, WE
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA INC, SEMICOND PROD DIV, PHOENIX, AZ 85008 USA
MOTOROLA INC, SEMICOND PROD DIV, PHOENIX, AZ 85008 USA
ARMSTRONG, WE
TOLLIVER, DL
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA INC, SEMICOND PROD DIV, PHOENIX, AZ 85008 USA
MOTOROLA INC, SEMICOND PROD DIV, PHOENIX, AZ 85008 USA
TOLLIVER, DL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(02)
: 307
-
310
[3]
BESKOVA ES, 1976, ZH ANAL KHIM, V31, P1572
[4]
BLOKHIN JA, 1965, METHODS XRAY SPECTRO
[5]
Brent R., 1973, ALGORITHMS MINIMIZAT
[6]
PHOSPHORUS CONCENTRATION PROFILES IN P-DOPED SILICON DIOXIDE MEASURED USING AUGER-SPECTROSCOPY
CHANG, CC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
CHANG, CC
ADAMS, AC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
ADAMS, AC
QUINTANA, G
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
QUINTANA, G
SHENG, TT
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
SHENG, TT
[J].
JOURNAL OF APPLIED PHYSICS,
1974,
45
(01)
: 252
-
256
[7]
PHOSPHORUS CONCENTRATION OF CHEMICAL VAPOR-DEPOSITED PHOSPHOSILICATE GLASS
CHOW, K
论文数:
0
引用数:
0
h-index:
0
机构:
BURROUGHS CORP,SAN DIEGO,CA 92127
BURROUGHS CORP,SAN DIEGO,CA 92127
CHOW, K
GARRISON, LG
论文数:
0
引用数:
0
h-index:
0
机构:
BURROUGHS CORP,SAN DIEGO,CA 92127
BURROUGHS CORP,SAN DIEGO,CA 92127
GARRISON, LG
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1977,
124
(07)
: 1133
-
1136
[8]
DARKEN LS, 1953, PHYSICAL CHEM METALS
[9]
MICROPROBE TECHNIQUE FOR DETERMINATION OF THICKNESS AND PHOSPHORUS CONCENTRATION OF GATE OXIDE PHOSPHOSILICATE GLASS IN FET DEVICES
DIGIACOMO, G
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, SYST PROD DIV, E FISHKILL FAC, HOPEWELL JUNCTION, NY 12533 USA
IBM CORP, SYST PROD DIV, E FISHKILL FAC, HOPEWELL JUNCTION, NY 12533 USA
DIGIACOMO, G
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(03)
: 419
-
422
[10]
DURANT P, 1975, CHEMICAL VAPOR DEPOS, P421
←
1
2
3
4
→
共 32 条
[1]
MEASURING THE PHOSPHORUS CONCENTRATION IN DEPOSITED PHOSPHOSILICATE FILMS
ADAMS, AC
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
ADAMS, AC
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
MURARKA, SP
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(02)
: 334
-
338
[2]
SCANNING ELECTRON-MICROSCOPE INVESTIGATION OF GLASS FLOW IN MOS INTEGRATED-CIRCUIT FABRICATION
ARMSTRONG, WE
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA INC, SEMICOND PROD DIV, PHOENIX, AZ 85008 USA
MOTOROLA INC, SEMICOND PROD DIV, PHOENIX, AZ 85008 USA
ARMSTRONG, WE
TOLLIVER, DL
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA INC, SEMICOND PROD DIV, PHOENIX, AZ 85008 USA
MOTOROLA INC, SEMICOND PROD DIV, PHOENIX, AZ 85008 USA
TOLLIVER, DL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(02)
: 307
-
310
[3]
BESKOVA ES, 1976, ZH ANAL KHIM, V31, P1572
[4]
BLOKHIN JA, 1965, METHODS XRAY SPECTRO
[5]
Brent R., 1973, ALGORITHMS MINIMIZAT
[6]
PHOSPHORUS CONCENTRATION PROFILES IN P-DOPED SILICON DIOXIDE MEASURED USING AUGER-SPECTROSCOPY
CHANG, CC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
CHANG, CC
ADAMS, AC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
ADAMS, AC
QUINTANA, G
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
QUINTANA, G
SHENG, TT
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
SHENG, TT
[J].
JOURNAL OF APPLIED PHYSICS,
1974,
45
(01)
: 252
-
256
[7]
PHOSPHORUS CONCENTRATION OF CHEMICAL VAPOR-DEPOSITED PHOSPHOSILICATE GLASS
CHOW, K
论文数:
0
引用数:
0
h-index:
0
机构:
BURROUGHS CORP,SAN DIEGO,CA 92127
BURROUGHS CORP,SAN DIEGO,CA 92127
CHOW, K
GARRISON, LG
论文数:
0
引用数:
0
h-index:
0
机构:
BURROUGHS CORP,SAN DIEGO,CA 92127
BURROUGHS CORP,SAN DIEGO,CA 92127
GARRISON, LG
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1977,
124
(07)
: 1133
-
1136
[8]
DARKEN LS, 1953, PHYSICAL CHEM METALS
[9]
MICROPROBE TECHNIQUE FOR DETERMINATION OF THICKNESS AND PHOSPHORUS CONCENTRATION OF GATE OXIDE PHOSPHOSILICATE GLASS IN FET DEVICES
DIGIACOMO, G
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, SYST PROD DIV, E FISHKILL FAC, HOPEWELL JUNCTION, NY 12533 USA
IBM CORP, SYST PROD DIV, E FISHKILL FAC, HOPEWELL JUNCTION, NY 12533 USA
DIGIACOMO, G
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(03)
: 419
-
422
[10]
DURANT P, 1975, CHEMICAL VAPOR DEPOS, P421
←
1
2
3
4
→