COMPARISON OF LASER-INITIATED AND THERMAL CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FILMS

被引：52

作者：

DEUTSCH, TF

RATHMAN, DD

机构：

来源：

关键词：

D O I：

10.1063/1.95333

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：623 / 625

页数：3

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