ROLE OF NALIDIXIC-ACID IN ISOLATION OF SALMONELLA-TYPHIMURIUM STRAINS CAPABLE OF GROWTH AT 48-DEGREES-C

被引：7

作者：

DROFFNER, ML

YAMAMOTO, N

机构：

[1] TEMPLE UNIV,HLTH SCI CTR,SCH MED,DEPT BIOCHEM,PHILADELPHIA,PA 19140

[2] TEMPLE UNIV,HLTH SCI CTR,SCH MED,FELS INST CANC RES & MOLEC BIOL,PHILADELPHIA,PA 19140

来源：

CURRENT MICROBIOLOGY | 1992年 / 25卷 / 05期

关键词：

D O I：

10.1007/BF01575858

中图分类号：

Q93 [微生物学];

学科分类号：

071005 ; 100705 ;

摘要：

Salmonella typhimurium thermotolerant mutants dependent on the presence of nalidixic acid for growth at 48-degrees-C were isolated and designated nalidixic acid-dependent, thermotolerant mutants, nal(d)ttl. Genetic mapping revealed that nal(d)ttl alleles map within the gyrA gene. When S. typhimurium strain Q was plated in the dark on nutrient agar containing nalidixic acid (20 mug/ml) as a photosensitizer and briefly exposed to white light or near VU light prior to incubation at 42-degrees-C, nalidixic acid-resistant mutants arose in about 16 h at frequencies of 5 x 10(-8) for white light and 1 x 10(-6) for near UV light. About 10% of these nalidixic acid-resistant mutants derived from photodynamic mutagenesis exhibited the thermotolerant characteristic.

引用

页码：257 / 260

页数：4

共 12 条

[1] PROCEDURE FOR ISOLATION OF ESCHERICHIA, SALMONELLA, AND PSEUDOMONAS MUTANTS CAPABLE OF GROWTH AT THE REFRACTORY TEMPERATURE OF 54-DEGREES-C [J].