MECHANISM OF FORMATION OF TRISILANE AND TETRASILANE IN THE REACTION OF ATOMIC-HYDROGEN WITH MONOSILANE AND THE THERMOCHEMISTRY OF THE SI2H4 ISOMERS

被引：70

作者：

BECERRA, R ^{[1
]}

WALSH, R ^{[1
]}

机构：

[1] UNIV READING,DEPT CHEM,READING RG6 2AD,BERKS,ENGLAND

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1987年 / 91卷 / 22期

关键词：

D O I：

10.1021/j100306a049

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：5765 / 5770

页数：6

共 38 条

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[9] GAS-PHASE HOMOLYTIC SUBSTITUTION-REACTIONS OF HYDROGEN-ATOMS AT SILICON CENTERS
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[J]. ORGANOMETALLICS, 1986, 5 (06) : 1231 - 1235
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[J]. JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS, 1986, (15) : 1189 - 1191

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