CHARACTERISTICS OF CLEANING AND CARBONIZING PLASMAS IN TEXTOR

被引：8

作者：

AMEMIYA, H

ISHII, S

OYAMA, H

SAKAMOTO, Y

MINAGAWA, H

SATAKE, T

HASHIBA, M

YAMASHINA, T

NODA, N

HORI, Y

AKAISHI, K

MIYAHARA, A

BANNO, T

WINTER, J

HOTHKER, K

BIEGER, W

机构：

[1] HOKKAIDO UNIV, FAC ENGN, KITA KU, SAPPORO, HOKKAIDO 060, JAPAN

[2] NAGOYA UNIV, INST PLASMA PHYS, CHIKUSA KU, NAGOYA, AICHI 464, JAPAN

[3] FORSCHUNGSZENTRUM JULICH, EURATOM ASSOC, INST PLASMA PHYS, D-5170 JULICH, FED REP GER

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1987年 / 26卷 / 09期

关键词：

D O I：

10.1143/JJAP.26.1534

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1534 / 1543

页数：10

共 20 条

[1] EXPERIMENTS ON THE ENERGY-DISTRIBUTION FUNCTION IN HYDROGEN PLASMAS
AMEMIYA, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1986, 25 (04): : 595 - 600
[2] BROWN SC, 1966, BASIC DATA PLASMA PH, P43
[3] TOTAL AND PARTIAL ELECTRON COLLISIONAL IONIZATION CROSS-SECTIONS FOR CH4, C2H6, SIH4, AND SI2H6
CHATHAM, H
HILS, D
ROBERTSON, R
GALLAGHER, A
[J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 81 (04) : 1770 - 1777
[4] A REVIEW OF THE WALL PROBLEM AND CONDITIONING TECHNIQUES FOR TOKAMAKS
DYLLA, HF
[J]. JOURNAL OF NUCLEAR MATERIALS, 1980, 93-4 (OCT) : 61 - 74
[5] GILARDINI A, 1972, LOW ENERGY ELECTRON, P102
[6] HORI Y, 1985, SHINKU, V28, P905
[7] AN ATTEMPT TO IMPROVE THE ELECTRON-CYCLOTRON RESONANCE DISCHARGE CLEANING OF A TOKAMAK DEVICE
ISHIBE, Y
ISHII, S
OKAZAKI, K
OYAMA, H
SAKAMOTO, Y
YANO, K
NODA, N
TOI, K
TANAHASHI, S
OKUBO, K
[J]. JOURNAL OF NUCLEAR MATERIALS, 1984, 128 (DEC) : 889 - 892
[8] ECR-DISCHARGE CLEANING FOR LINER-CONTAINING TOKAMAKS
ISHII, S
OKAZAKI, K
SAKAMOTO, Y
YANO, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (07): : L403 - L405
[9] JONES EM, 1977, CLM R175 CULH REP
[10] STUDY OF THE DISCHARGE CLEANING PROCESS IN JIPP T-II TORUS BY RESIDUAL-GAS ANALYZER
NODA, N
HIROKURA, S
TANIGUCHI, Y
TANAHASHI, S
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03): : 1430 - 1434