PHONONS LOCALIZED AT STEP EDGES - A ROUTE TO UNDERSTANDING FORCES AT EXTENDED SURFACE-DEFECTS

被引：32

作者：

NIU, L

GASPAR, DJ

SIBENER, SJ

机构：

[1] UNIV CHICAGO, JAMES FRANCK INST, CHICAGO, IL 60637 USA

[2] UNIV CHICAGO, DEPT PHYS, CHICAGO, IL 60637 USA

[3] UNIV CHICAGO, DEPT CHEM, CHICAGO, IL 60637 USA

来源：

SCIENCE | 1995年 / 268卷 / 5212期

关键词：

D O I：

10.1126/science.268.5212.847

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

Inelastic helium atom scattering has been used to measure the phonons on a stepped metallic crystalline surface, Ni(977). When the scattering plane is oriented parallel to the step edges and perpendicular to the terraces, two branches of step-induced phonons are observed. These branches are identified as transversely polarized, step-localized modes that propagate along the step edge. Analysis reveals significant anisotropy in the force field near the step edge, with all forces near the step edge being substantially smaller than in the bulk. Such measurements provide valuable information on metallic bonding and interface stability near extended surface defects.

引用

页码：847 / 850

页数：4

共 32 条

[1] FINITE-TEMPERATURE PHASE-DIAGRAM OF VICINAL SI(100) SURFACES [J].