ENHANCEMENT OF CRITICAL-CURRENT DENSITY IN DIRECT-CURRENT-SPUTTERED TLBA2CA2CU3O9-/+DELTA SUPERCONDUCTING THIN-FILMS

被引：29

作者：

JUANG, JY

HORNG, JH

CHEN, SP

FU, CM

WU, KH

UEN, TM

GOU, YS

机构：

[1] Institute of Electrophysics, National Chiao-Tung University, Hsinchu

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 07期

关键词：

D O I：

10.1063/1.113420

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A multistep postannealing scheme has been developed for preparing nearly single phased, c-axis oriented TlBa2Ca2Cu3Ox (Tl-1223) superconducting thin films fabricated by the direct-current-sputtering process. Films obtained by the present process have shown, for the first time in this system, a critical current density (Jc) above 106A/cm2 at 77 K with a zero-resistance transition temperature Tc0≈110K. The order of magnitude enhancement in Jc is attributed to the improvement of film morphology which, in turn, removed most of the weak links encountered previously.© 1995 American Institute of Physics.

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页码：885 / 887

页数：3

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