A STUDY OF THE CURRENT EFFICIENCY DECREASE ACCOMPANYING SHORT PULSE TIME FOR PULSE PLATING

被引：27

作者：

CHEN, CJ

WAN, CC

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 10期

关键词：

D O I：

10.1149/1.2096298

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2850 / 2855

页数：6

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