SITE-CONTROLLED GROWTH OF NANOWHISKERS

被引:47
作者
SATO, T
HIRUMA, K
SHIRAI, M
TOMINAGA, K
HARAGUCHI, K
KATSUYAMA, T
SHIMADA, T
机构
[1] Central Research Laboratory, Hitachi, Ltd, Kokubunji
关键词
D O I
10.1063/1.113549
中图分类号
O59 [应用物理学];
学科分类号
摘要
The metalogranic vapor-phase epitaxy (MOVPE) growth of site-controlled nanowhiskers having a single preferential growth direction is accomplished by using a SiO2 window mask. A small window size (200×200 nm in this experiment) is essential for growing a single whisker from a single Au- seed cluster formed inside each window of the mask. The presence of the SiO2 mask greatly influences the MOVPE growth process, especially the growth direction and resultant diameter of the whiskers. This influence may be due to surface migration of the source materials or source gas diffusion near the surface from the masked region to the window region. © 1995 American Institute of Physics.
引用
收藏
页码:159 / 161
页数:3
相关论文
共 10 条
[1]   MOVPE GROWTH OF SIO2-MASKED INP STRUCTURES AT REDUCED PRESSURES [J].
CLAWSON, AR ;
HANSON, CM ;
VU, TT .
JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) :334-339
[2]   FUNDAMENTAL ASPECTS OF VLS GROWTH [J].
GIVARGIZOV, EI .
JOURNAL OF CRYSTAL GROWTH, 1975, 31 (DEC) :20-30
[3]  
GIVARGIZOV EI, 1975, J CRYST GROWTH, V20, P217
[4]  
HIRUMA K, 1993, J APPL PHYS, V73, P3163
[5]   SELECTIVE AREA GROWTH OF HIGH-QUALITY GAAS BY OMCVD USING NATIVE OXIDE MASKS [J].
JONES, SH ;
LAU, KM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (12) :3149-3155
[6]   SELECTIVE EPITAXIAL-GROWTH OF GAAS BY LOW-PRESSURE MOVPE [J].
KAMON, K ;
TAKAGISHI, S ;
MORI, H .
JOURNAL OF CRYSTAL GROWTH, 1985, 73 (01) :73-76
[7]  
MURATA M, 1989, I PHYSICS C SERIES, V106, P87
[8]   TOWARD QUANTUM WELL WIRES - FABRICATION AND OPTICAL-PROPERTIES [J].
PETROFF, PM ;
GOSSARD, AC ;
LOGAN, RA ;
WIEGMANN, W .
APPLIED PHYSICS LETTERS, 1982, 41 (07) :635-638
[10]   LOWER-DIMENSIONAL QUANTUM STRUCTURES BY SELECTIVE GROWTH AND GAS-PHASE NUCLEATION [J].
VAHALA, KJ ;
SAUNDERS, WA ;
TSAI, CS ;
SERCEL, PC ;
KUECH, T ;
ATWATER, HA ;
FLAGAN, RC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (04) :1660-1666