INFLUENCE OF HIGHLY CHARGED IMPURITIES ON ION TEMPERATURES MEASURED WITH ACTIVE-BEAM PLASMA DIAGNOSTICS

被引：8

作者：

DONNE, AJH ^{[1
]}

DEHEER, FJ ^{[1
]}

机构：

[1] FOM,INST ATOOM & MOLEC FYS,1009 DB AMSTERDAM,NETHERLANDS

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 03期

关键词：

D O I：

10.1063/1.339732

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：780 / 786

页数：7

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