IMPURITY DEPOSITION ON ALT-I LIMITER HEADS

被引：26

作者：

MCGRATH, RT

DOYLE, BL

BROOKS, JN

PONTAU, AE

THOMAS, GJ

机构：

[1] SANDIA NATL LABS, LIVERMORE, CA 94550 USA

[2] ARGONNE NATL LAB, ARGONNE, IL 60439 USA

来源：

关键词：

D O I：

10.1016/0022-3115(87)90419-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：660 / 664

页数：5

共 14 条

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