EFFECT OF ANODE BIAS ON THE INDEX OF REFRACTION OF AL2O3 THIN-FILMS DEPOSITED BY DC S-GUN MAGNETRON REACTIVE SPUTTERING

Using direct-current anode bias in an S-Gun magnetron sputtering system during the reactive deposition of Al2O3 increases the index of refraction from 1.52 to 1.70. This effect takes place at less than 75% of the 02 flow rate necessary to convert the sputter cathode from the metal mode to the oxide mode. A second effect of sputtering in the linear portion before the ''knee'' of the voltage versus 02 flow rate curve (hysteresis curve) is a stable and noise-free deposition.