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SURFACE ELECTRONIC-STRUCTURE OF NI3AL(001)

被引：9
作者：
CHULKOV, EV
NIKIFOROV, AV
LIPNITSKII, AG
机构：
[1] Institute of Strength Physics and Materials Science, the Russian Academy of Sciences, 634055 Tomsk
来源：
VACUUM | 1994年 / 45卷 / 2-3期
关键词：
D O I：
10.1016/0042-207X(94)90164-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The electronic structure of the Ni3Al(001) surface is calculated using the self-consistent film linearized augmented-plane-wave method. As a result, surface states both above and below the Fermi level have been found. Practically, all the occupied surface states are generated by the atoms of nickel There is only one occupied state at the (M) over bar point localized at the surface atoms of aluminium. The states above the Fermi level are mainly localized at the Al atoms of the surface layer. There are states totally generated by the atoms of aluminium. Calculated work function exceeds the corresponding values for the Ni(001) and Al(001) surfaces.
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页码：175 / 177
页数：3
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