DEPENDENCE OF CONFORMATIONAL AND ISOMER STABILITY ON NUMBER OF ELECTRONS IN EXTENDED PI SYSTEMS

被引：178

作者：

HOFFMANN, R

OLOFSON, RA

机构：

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1966年 / 88卷 / 05期

关键词：

D O I：

10.1021/ja00957a015

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：943 / &

共 26 条

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