CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN-OXIDES - A COMPARATIVE-STUDY BY X-RAY PHOTOELECTRON-SPECTROSCOPY, X-RAY-DIFFRACTION AND REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION

被引：40

作者：

YOUS, B ^{[1
]}

ROBIN, S ^{[1
]}

DONNADIEU, A ^{[1
]}

DUFOUR, G ^{[1
]}

MAILLOT, C ^{[1
]}

ROULET, H ^{[1
]}

SENEMAUD, C ^{[1
]}

机构：

[1] UNIV PIERRE & MARIE CURIE,CNRS,CHIM PHYS LAB 176,F-75231 PARIS 05,FRANCE

来源：

MATERIALS RESEARCH BULLETIN | 1984年 / 19卷 / 10期

关键词：

D O I：

10.1016/0025-5408(84)90199-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：1349 / 1354

页数：6

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