EXPITAXIAL GROWTH OF AG DEPOSITED BY ION DEPOSITION ON NACI

被引：20

作者：

NAMBA, Y ^{[1
]}

MORI, T ^{[1
]}

机构：

[1] TOKYO NOKO UNIV, FAC TECHNOL, DEPT ELECT ENGN, TOKYO, JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.568971

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：693 / 697

页数：5

共 13 条

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[6]

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[9] NUCLEATION GROWTH STRUCTURE AND EPITAXY OF THIN SURFACE FILMS [J].

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[10] NUCLEATION KINETICS OF GOLD DEPOSITION ONTO UHV CLEAVED SURFACES OF KCL AND NAF [J].

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