A MODEL FOR PULSED LASER MELTING OF GRAPHITE

被引:90
作者
STEINBECK, J
BRAUNSTEIN, G
DRESSELHAUS, MS
VENKATESAN, T
JACOBSON, DC
机构
[1] BELL COMMUN RES,MURRAY HILL,NJ 07974
[2] AT&T BELL LABS,MURRAY HILL,NJ 07974
关键词
D O I
10.1063/1.335527
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4374 / 4382
页数:9
相关论文
共 35 条
[1]   GRAPHITE SUBLIMATION TEMPERATURES, CARBON ARCS AND CRYSTALLINE EROSION [J].
ABRAHAMSON, J .
CARBON, 1974, 12 (02) :111-+
[2]  
[Anonymous], 1972, LIQUID METALS CHEM P
[3]   MELTING MODEL FOR PULSING-LASER ANNEALING OF IMPLANTED SEMICONDUCTORS [J].
BAERI, P ;
CAMPISANO, SU ;
FOTI, G ;
RIMINI, E .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :788-797
[4]   LATTICE CONSTANTS OF GRAPHITE AT LOW TEMPERATURES [J].
BASKIN, Y ;
MEYER, L .
PHYSICAL REVIEW, 1955, 100 (02) :544-544
[5]  
BRAUNSTEIN G, UNPUB
[6]   MELTING OF GRAPHITE AT VERY HIGH PRESSURE [J].
BUNDY, FP .
JOURNAL OF CHEMICAL PHYSICS, 1963, 38 (03) :618-+
[7]  
CARSLAW HS, 1959, CONDUCTION HEAT SOLI
[8]  
CLARKE RTJ, UNPUB
[9]   RAMAN-SCATTERING FROM ION-IMPLANTED GRAPHITE [J].
ELMAN, BS ;
DRESSELHAUS, MS ;
DRESSELHAUS, G ;
MABY, EW ;
MAZUREK, H .
PHYSICAL REVIEW B, 1981, 24 (02) :1027-1034
[10]  
ELMAN BS, 1983, THESIS MIT