EFFECT OF NITRIDATION RATE ON THE COMPOSITION AND CONDUCTIVITY OF TITANIUM NITRIDE FILMS PREPARED FROM SOL-GEL TITANIA

被引：14

作者：

KEDDIE, JL

LI, J

MAYER, JW

GIANNELIS, EP

机构：

[1] Department of Materials Science and Engineering, Cornell University, Ithaca, New York

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1991年 / 74卷 / 11期

关键词：

D O I：

10.1111/j.1151-2916.1991.tb06869.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Nitridation of TiO2 films in NH3 was studied as a function of heating rate by N-14(alpha, alpha)N-14 and O-16(alpha, alpha)O-16 nuclear resonance, Auger depth profiling, X-ray diffraction, and electrical conductivity measurements. TiN films containing minimal amount of oxygen and exhibiting the lowest resistivity were obtained when the fastest nitridation rate (70-degrees-C/min) was used. Nitridation at slower rates not only increased the film-oxygen content and electrical resistivity but also produced an oxygen concentration gradient across the film.

引用

页码：2937 / 2940

页数：4