MAGNETIC AND STRUCTURAL CHARACTERIZATION OF SPUTTERED FEN MULTILAYER FILMS

被引:36
作者
RUSSAK, MA
JAHNES, CV
KLOKHOLM, E
LEE, JW
RE, ME
WEBB, BC
机构
[1] IBM Research Division, T. J. Watson Research Center, Yorktown Heights
关键词
D O I
10.1063/1.349918
中图分类号
O59 [应用物理学];
学科分类号
摘要
The magnetic and structural properties of ferromagnetic FeN thin films, FeN/FeN (ferromagnetic/paramagnetic), and FeN/SiO2 multilayers deposited in a rotational dc magnetron sputter system were investigated. Monolithic films containing congruent-to 2 at. % N2 had 4-pi-M(s) values congruent-to 25 kG. The Fe16N2 phase has been identified by electron microdiffraction in these films. Saturation magnetostriction (lambda-s) has been related to N2 content and can be varied from -3 x 10(-6) to 5 x 10(-6) in a range of compositions where 4-pi-M(s) is > 22 kG. Lamination reduced easy and hard axis coercivity to < 1 Oe and produced single domain configurations in yoke-shaped structures. Lorentz microscopy indicated that the ferromagnetic FeN layers in the FeN/FeN films were exchanged coupled while those in the FeN/SiO2 films were magnetostatically coupled.
引用
收藏
页码:6427 / 6429
页数:3
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