AN ANALYTICAL MODEL FOR THE GATE CAPACITANCE OF SMALL-GEOMETRY MOS STRUCTURES

被引:19
作者
GREENEICH, EW
机构
关键词
D O I
10.1109/T-ED.1983.21456
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1838 / 1839
页数:2
相关论文
共 5 条
[1]  
CHURCHILL RV, 1960, COMPLEX VARIABLES AP, P223
[2]   DIRECT METHOD FOR CALCULATION OF EDGE CAPACITANCE OF THICK ELECTRODES [J].
KAMCHOUCHI, HE ;
ZAKY, AA .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1975, 8 (12) :1365-1371
[3]  
MULLER RS, 1977, DEVICE ELECTRONICS I, P314
[4]   CAPACITANCE MODELS FOR INTEGRATED-CIRCUIT METALLIZATION WIRES [J].
RUEHLI, AE ;
BRENNAN, PA .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1975, 10 (06) :530-536
[5]   SIMPLE FORMULAS FOR TWO-DIMENSIONAL AND 3-DIMENSIONAL CAPACITANCES [J].
SAKURAI, T ;
TAMARU, K .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (02) :183-185