NEW CONCEPTS IN PROJECTION MASK ALIGNERS

被引：112

作者：

OFFNER, A ^{[1
]}

机构：

[1] PERKIN ELMER CORP, ELECTRO OPTICAL DIV, S WILTON, CT 06897 USA

来源：

OPTICAL ENGINEERING | 1975年 / 14卷 / 02期

关键词：

D O I：

10.1117/12.7978742

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A new concept (the annular field optical system) makes it possible to avoid the extreme complexity of conventional projection mask alignment objectives. This was realized in a new, simple, all-reflecting optical system that consists of two, concentric, spherical mirrors. A monolithic block consisting of three mutually perpendicular plane mirrors is used to fold the system into a configuration that makes possible an inherently synchronous, simple scanning arrangement. Partially coherent illumination is used to increase the effective MTF without decreasing the depth of focus.

引用

页码：130 / 132

页数：3