A NEW MACHINE FOR FILM FORMATION BY ION AND VAPOR-DEPOSITION

被引：42

作者：

ANDOH, Y

SUZUKI, Y

MATSUDA, K

SATOU, M

FUJIMOTO, F

机构：

[1] GOVT IND RES INST,IKEDA,OSAKA 563,JAPAN

[2] UNIV TOKYO,COLL GEN EDUC,TOKYO 153,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1985年 / 6卷 / 1-2期

关键词：

D O I：

10.1016/0168-583X(85)90618-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：111 / 115

页数：5

共 6 条

[1]

AKIBA M, 1982, 6TH P S ION SOURC IO, P123

[2]

IWAKI M, 1982, 6TH P S ION SOURC IO, P419

[3]

Matsuda K., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P717

[4]

SATOU M, 1983, JPN J APPL PHYS, V22, P171

[5]

SATOU M, 1983, VACUUM, V26, P287

[6]

SATOU M, 1982, 6TH P S ION SOURC IO, P425

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