A TIME-OF-FLIGHT SECONDARY ION-MICROSCOPE

被引：98

作者：

SCHUELER, B

SANDER, P

REED, DA

机构：

[1] Charles Evans and Associates, Redwood City, CA 94063

来源：

VACUUM | 1990年 / 41卷 / 7-9期

关键词：

D O I：

10.1016/0042-207X(90)94047-T

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A stigmatic imaging Time-of-Flight secondary ion microscope has been developed. The instrument has demonstrated mass resolutions of m/DELTA-m = 3100 (fwhm at mass 28) and image resolutions of up to approximately 1-mu-m. Secondary ion images and mass spectra are presented to demonstrate analytical capabilities for ion imaging, exact mass determination, and minor element detection.

引用

页码：1661 / 1664

页数：4

共 6 条

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[J]. APPLIED PHYSICS LETTERS, 1989, 54 (08) : 715 - 717
[4] DETECTION OF METALLIC TRACE IMPURITIES ON SI(100) SURFACES WITH TOTAL REFLECTION X-RAY-FLUORESCENCE (TXRF)
PENKA, V
HUB, W
[J]. FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE, 1989, 333 (4-5): : 586 - 589
[5] SCHUELER B, 1989, IN PRESS 7TH P INT C
[6] Slodzian G., 1980, APPLIED CHARGED PA B, V13B, P1

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