EFFECT OF TEMPERATURE ON ELECTRICAL AND MICROSTRUCTURAL CHANGES OF COEVAPORATED IR-SI ALLOY-FILMS

被引：20

作者：

WEISS, BZ

TU, KN

SMITH, DA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 02期

关键词：

D O I：

10.1063/1.336646

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：415 / 423

页数：9

共 14 条

[1] Kinetics of phase change I - General theory [J].

Avrami, M .

JOURNAL OF CHEMICAL PHYSICS, 1939, 7 (12) :1103-1112

[2]

Avrami M., 1940, J CHEM PHYS, V8, P212, DOI [DOI 10.1063/1.1750631, 10.1063/1.1750631]

[3]

BHAN S, 1960, Z METALLKD, V57, P327

[4] PT2SI AND PTSI FORMATION WITH HIGH-PURITY PT THIN-FILMS [J].

CANALI, C ;

CATELLANI, C ;

PRUDENZIATI, M ;

WADLIN, WH ;

EVANS, CA .

APPLIED PHYSICS LETTERS, 1977, 31 (01) :43-45

[5] FORMATION OF NI AND PT SILICIDE 1ST PHASE - DOMINANT ROLE OF REACTION-KINETICS [J].

CANALI, C ;

CATELLANI, F ;

OTTAVIANI, G ;

PRUDENZIATI, M .

APPLIED PHYSICS LETTERS, 1978, 33 (02) :187-190

[6]

ELLIOTT RP, 1965, CONSTITUTION BINARY, P562

[7]

ENGSTROM I, 1970, STRUCTURAL CHEM PLAT

[8]

GHOZLENE HB, 1978, J APPL PHYS, V49, P3998, DOI 10.1063/1.325358

[9]

MURARKA SP, 1983, SILICIDES VLSI APPLI

[10] TEMPERATURE-DEPENDENCE OF SEMICONDUCTING AND STRUCTURAL-PROPERTIES OF CR-SI THIN-FILMS [J].

NAVA, F ;

TIEN, T ;

TU, KN .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) :2018-2025

← 1 2 →