HIGH REPETITION RATE, WIDE-APERTURE KRF LASERS FOR SUBPICOSECOND AMPLIFICATION

被引：22

作者：

NODOMI, R

OEDA, Y

SAJIKI, K

NAKAJIMA, S

WATANABE, M

WATANABE, S

机构：

[1] MITSUI PETROCHEM IND CO LTD,HIGH PERFORMANCE MAT & PROD LAB,CHIBA 29902,JAPAN

[2] HITACHI MET LTD,MAGNET & ELECTR,KUMAGAYA,MAT RES LAB,SAITAMA 360,JAPAN

[3] UNIV TOKYO,MINATO KU,INST SOLID STATE PHYS,MINATO KU,TOKYO 160,JAPAN

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1991年 / 27卷 / 03期

关键词：

D O I：

10.1109/3.81344

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A high repetition rate, wide-aperture KrF laser with a magnetic switch has been developed. A dynamic response and a core loss of several magnetic materials were measured, resulting a loss as low as 0.45 J/pulse for a voltage risetime of approximately 100 ns. A maximum output energy of 2.5 J in 20 ns (FWHM) was obtained with a total efficiency of 2.5% at 20 Hz. The cross section of the output beam was 65 x 50 mm2. Spectral, spatial, and temporal profiles of gain and absorption coefficients were also measured, resulting in a peak gain of 8.5%/cm. An output energy of 410 mJ was extracted in 280 fs with two beams by using this laser as an amplifier.

引用

页码：441 / 447

页数：7

共 36 条

[1] IMPROVED UNIFORM-FIELD ELECTRODE PROFILES FOR TEA LASER AND HIGH-VOLTAGE APPLICATIONS [J].