THE ELECTRODEPOSITION AND PROPERTIES OF AMORPHOUS CHROMIUM FILMS PREPARED FROM CHROMIC-ACID SOLUTIONS

被引:81
作者
HOSHINO, S
LAITINEN, HA
HOFLUND, GB
机构
[1] UNIV FLORIDA,DEPT CHEM,GAINESVILLE,FL 32611
[2] UNIV FLORIDA,DEPT CHEM ENGN,GAINESVILLE,FL 32611
关键词
D O I
10.1149/1.2108653
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:681 / 685
页数:5
相关论文
共 9 条
  • [1] Crowther J.C., 1975, ELECTROPLAT MET FINI, V28, P6
  • [2] Fink C. G., 1926, U.S. Patent, Patent No. [1,581,188, 1581188]
  • [3] Furuya H., 1981, J MET FINISH SOC JPN, V32, P631
  • [4] A SURFACE STUDY OF AMORPHOUS CHROMIUM FILMS ELECTRODEPOSITED FROM CHROMIC-ACID SOLUTIONS .1.
    HOFLUND, GB
    ASBURY, DA
    BABB, SJ
    GROGAN, AL
    LAITINEN, HA
    HOSHINO, S
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (01): : 26 - 30
  • [5] HOFLUND GB, UNPUB
  • [6] HOSHINO S, UNPUB
  • [7] KASAAIAN AM, 1984, PLAT SURF FINISH, V71, P66
  • [8] MORIKAWA T, 1984, 70TH ANN C MET FIN S
  • [9] Sargent G.J., 1920, T AM ELECTROCHEM SOC, V37, P479