INFLUENCE OF RAPID THERMAL ANNEALING PARAMETERS ON PROPERTIES OF YBACUO THIN-FILMS SPUTTERED ON POLYCRYSTALLINE ZIRCONIA

被引：3

作者：

BAIXERAS, J

CARRIE, F

TEHERANI, FH

KREISLER, A

机构：

[1] Laboratoire de Génie Electrique de Paris (URA 127 CNRS), Ecole Supérieure d Electricité, 91192 Gif Sur Yvette Cedex, Plateau du Moulon

来源：

JOURNAL OF THE LESS-COMMON METALS | 1990年 / 164卷

关键词：

D O I：

10.1016/0022-5088(90)90235-C

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

High-Tc YBaCuO thin films have been prepared on polycrystalline ZrO2 substrates by low temperature r.f. diode sputtering, followed by rapid thermal annealing (RTA). The gas atmosphere during RTA influences the roughness of the films and time/temperature parameters are critical. A Tc(R = 0) of 85 K has been obtained with c-axis oriented films, but these have low Jc (1500 A.cm-2 at 77 K). Besides, repeated RTA processes are a suitable way to increase the grain size and improve the orientation of the films. © 1990.

引用

页码：366 / 373

页数：8

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