TETRAHEDRAL CARBON-FILM BY HYDROGEN GAS REACTIVE RF-SPUTTERING OF GRAPHITE ONTO LOW-TEMPERATURE SUBSTRATE

被引：34

作者：

HIRAKI, A

KAWANO, T

KAWAKAMI, Y

HAYASHI, M

机构：

[1] OSAKA UNIV,INST SCI & IND RES,IBARAKI,OSAKA 567,JAPAN

[2] MEIDENSHA ELECT MFG CO,DEPT RES & DEV,SHINAGAWA KU,TOKYO 141,JAPAN

来源：

SOLID STATE COMMUNICATIONS | 1984年 / 50卷 / 08期

关键词：

D O I：

10.1016/0038-1098(84)90970-0

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：713 / 716

页数：4

共 21 条

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON [J].

AISENBERG, S ;

CHABOT, R .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (07) :2953-+

[2] DIAMOND-LIKE CARBON-FILMS PRODUCED IN A BUTANE PLASMA [J].

BERG, S ;

ANDERSSON, LP .

THIN SOLID FILMS, 1979, 58 (01) :117-120

[3]

BEVILOGUA K, 1979, SURFACE, V86, P308

[4] RF-PLASMA DEPOSITED AMORPHOUS HYDROGENATED HARD CARBON THIN-FILMS - PREPARATION, PROPERTIES, AND APPLICATIONS [J].

BUBENZER, A ;

DISCHLER, B ;

BRANDT, G ;

KOIDL, P .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4590-4595

[5] HARD CARBON COATINGS WITH LOW OPTICAL-ABSORPTION [J].

DISCHLER, B ;

BUBENZER, A ;

KOIDL, P .

APPLIED PHYSICS LETTERS, 1983, 42 (08) :636-638

[6] STRUCTURE AND BONDING OF HYDROCARBON PLASMA GENERATED CARBON-FILMS - AN ELECTRON-ENERGY LOSS STUDY [J].

FINK, J ;

MULLERHEINZERLING, T ;

PFLUGER, J ;

BUBENZER, A ;

KOIDL, P ;

CRECELIUS, G .

SOLID STATE COMMUNICATIONS, 1983, 47 (09) :687-691

[7] EPITAXIAL SYNTHESIS OF DIAMOND BY CARBON-ION DEPOSITION AT LOW-ENERGY [J].

FREEMAN, JH ;

TEMPLE, W ;

GARD, GA .

NATURE, 1978, 275 (5681) :634-635

[8] DEPOSITION OF HARD AND INSULATING CARBONACEOUS FILMS ON AN RF TARGET IN A BUTANE PLASMA [J].

HOLLAND, L ;

OJHA, SM .

THIN SOLID FILMS, 1976, 38 (02) :L17-L19

[9] GROWTH OF HYDROGENATED GERMANIUM MICRO-CRYSTAL BY REACTIVE SPUTTERING [J].

IMURA, T ;

TASHIRO, M ;

OHBIKI, T ;

TERAUCHI, H ;

HIRAKI, A ;

TSUJI, K ;

MINOMURA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (08) :L505-L507

[10] HYDROGENATED CRYSTALLINE SILICON FABRICATED AT LOW-SUBSTRATE TEMPERATURES BY REACTIVE SPUTTERING IN HE-H2 ATMOSPHERE [J].

IMURA, T ;

MOGI, K ;

HIRAKI, A ;

NAKASHIMA, S ;

MITSUISHI, A .

SOLID STATE COMMUNICATIONS, 1981, 40 (02) :161-164

← 1 2 3 →