RESISTIVITY OF PERMALLOY THIN-FILMS

被引：64

作者：

MAYADAS, AF ^{[1
]}

JANAK, JF ^{[1
]}

GANGULEE, A ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 06期

关键词：

D O I：

10.1063/1.1663668

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2780 / 2781

页数：2

共 10 条

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[2]

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[3] STRUCTURE OF THIN NI-FE FILMS [J].

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DAS, G .

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[4]

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[5]

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[6]

KRONGELB S, 1973, IEEE T, VMAG9, P568

[7] ELECTRICAL-RESISTIVITY MODEL FOR POLYCRYSTALLINE FILMS - CASE OF ARBITRARY REFLECTION AT EXTERNAL SURFACES [J].

MAYADAS, AF ;

SHATZKES, M .

PHYSICAL REVIEW B, 1970, 1 (04) :1382-&

[8] COMPOSITIONAL + THICKNESS DEPENDENCE OF FERROMAGNETIC ANISOTROPY IN RESISTANCE OF IRON-NICKEL FILMS [J].

MITCHELL, EN ;

BALE, HD ;

HAUKAAS, HB ;

STREEPER, JB .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2604-&

[9]

MORUZZI VL, PRIVATE COMMUNICATIO

[10]

Ziman J. M., 1960, ELECT PHONONS

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