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EFFECT OF FREQUENCY ON ELECTRICAL RESISTIVITY OF GRANULAR METAL FILMS

被引：8
作者：
HIRSCH, AA
BAZIAN, S
FRIEDMAN, N
机构：
来源：
VACUUM | 1964年 / 14卷 / 10期
关键词：
D O I：
10.1016/0042-207X(64)90476-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：393 / &
相关论文
共 11 条
[1]   A POSSIBLE EXPLANATION OF THE INCREASE OF THE ELECTRICAL RESISTANCE OF THIN METAL FILMS AT LOW TEMPERATURES AND SMALL FIELD STRENGTHS [J].
GORTER, CJ .
PHYSICA, 1951, 17 (08) :777-780
[2]   TIME + FIELD EFFECTS IN ELECTRICAL CONDUCTION OF THIN METALLIC LAYERS AT LOW TEMPERATURES [J].
HIRSCH, AA ;
FRIEDMAN, N .
PHYSICA, 1964, 30 (02) :389-&
[3]   INDUCED MAGNETIC ANISOTROPHY IN THIN FERROMAGNETIC FILMS INVESTIGATED AT LOW TEMPERATURES [J].
HIRSCH, AA ;
FRIEDMAN, N .
PHYSICA, 1963, 29 (05) :543-&
[4]   INFLUENCE OF A MAGNETIC FIELD ON THE ELECTRICAL RESISTANCE OF THIN FERROMAGNETIC LAYERS AT LOW TEMPERATURES [J].
HIRSCH, AA .
PHYSICA, 1959, 25 (07) :581-589
[5]   ELECTRICAL CONDUCTION OF THIN METALLIC LAYERS AT HIGH FREQUENCIES DOWN TO LIQUID HELIUM TEMPERATURES [J].
HIRSCH, AA ;
BAZIAN, S .
PHYSICA, 1964, 30 (01) :258-&
[6]  
HIRSCH AA, 1960, B I INT FROID ANNEXE, P229
[7]  
HOLLAND L, 1961, VACUUM DEPOTITION TH, P325
[8]  
HOLLAND L, 1961, VACUUM DEPOTITION TH, P6
[9]  
MOSTOVETCH N, 1951, CR HEBD ACAD SCI, V233, P360
[10]  
NEUGEBAUER CA, 1961, ELECTRISCHE MAGNETIS, P34
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