SPUTTER DEPOSITION OF ICOSAHEDRAL AL-MN AND AL-MN-SI

被引：39

作者：

KREIDER, KG

BIANCANIELLO, FS

KAUFMAN, MJ

机构：

来源：

SCRIPTA METALLURGICA | 1987年 / 21卷 / 05期

关键词：

D O I：

10.1016/0036-9748(87)90380-2

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：657 / 662

页数：6

共 12 条

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[3] ICOSAHEDRAL-PHASE FORMATION BY SOLID-STATE INTERDIFFUSION
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[4] FORMATION OF ICOSAHEDRAL AL(MN) BY DIRECTED ENERGY PROCESSES
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[5] IRO2 RADIOFREQUENCY SPUTTERED THIN-FILM PROPERTIES
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[6] The interaction of atoms and molecules with solid surfaces XI - The dispersal of energy from an activated link
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[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1937, 163 (A912) : 0127 - 0131
[7] LILLIENFELD DA, 1985, PHYS REV LETT, V55, P1587
[8] Robertson James W., COMMUNICATION
[9] THE METALLURGY OF QUASI-CRYSTALS
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[J]. SCRIPTA METALLURGICA, 1986, 20 (09): : 1187 - 1192
[10] SCHIAVONE LM, 1979, APPL PHYS LETT, V35