THERMODYNAMIC CALCULATIONS FOR THE CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE

被引：91

作者：

KINGON, AI ^{[1
]}

LUTZ, LJ ^{[1
]}

LIAW, P ^{[1
]}

DAVIS, RF ^{[1
]}

机构：

[1] N CAROLINA STATE UNIV, DEPT MAT ENGN, RALEIGH, NC 27650 USA

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1983年 / 66卷 / 08期

关键词：

D O I：

10.1111/j.1151-2916.1983.tb10091.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：558 / 566

页数：9

共 37 条

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[3]

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[5]

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HUDSON, RG .

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[7]

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[8]

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[10]

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