SURFACE ORGANOMETALLIC CHEMISTRY ON OXIDES - REACTION OF CO WITH BIS(ALLYL)RHODIUM GRAFTED ONTO SILICA, TITANIA, AND ALUMINA

被引:24
作者
DUFOUR, P [1 ]
SCOTT, SL [1 ]
SANTINI, CC [1 ]
LEFEBVRE, F [1 ]
BASSET, JM [1 ]
机构
[1] ECOLE CHIM PHYS ELECTR LYON,CHIM ORGANOMET SURFACE LAB,CNRS,UMR 9986,43 BLVD 11 NOVEMBRE 1918,F-69616 VILLEURBANNE,FRANCE
关键词
D O I
10.1021/ic00090a007
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Tris(allyl)rhodium(III) reacts with the hydroxyl-terminated surfaces of silica, titania, and alumina to form a surface bis(allyl)rhodium(III) fragment. In the presence of CO, this supported organometallic fragment undergoes a series of reactions which model elementary steps of heterogeneous C-C and C-O bond formation. On surfaces with low proton content (silica-400, alumina, titania), 1,5-hexadiene is produced quantitatively by reductive coupling of two allyl ligands, with simultaneous formation of surface-Bound dicarbonylrhodium(I). In the presence of a high concentration of surface protons (silica-200), there are two reaction pathways: (i) formation of propene by reaction of an allyl ligand with a surface proton and (ii) insertion of CO into the metal-carbon bond to give the acyl complex CH2=CHCH2C(O)Rh(III), detected by IR. The acyl ligand may undergo reductive elimination with an allyl ligand, giving the minor product 1,6-heptadien-4-one, or with a siloxy ligand, with transfer of 3-butenoate to the silica support (extracted as methyl-3 butenoate). The dicarbonylrhodium(I) product is mobile on the surface of silica: dimerization occurs spontaneously. Under H-2, reduction and aggregation of the dimers leads to small metal particles.
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页码:2509 / 2517
页数:9
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