COLLOID SIZE DISTRIBUTIONS IN ION-IMPLANTED GLASS

被引：65

作者：

NISTOR, LC

VANLANDUYT, J

BARTON, JD

HOLE, DE

SKELLAND, ND

TOWNSEND, PD

机构：

[1] UNIV SUSSEX,DEPT PHYS,BRIGHTON BN1 9QH,E SUSSEX,ENGLAND

[2] UNIV ANTWERP,RUCA,B-2020 ANTWERP,BELGIUM

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1993年 / 162卷 / 03期

关键词：

D O I：

10.1016/0022-3093(93)91240-4

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Ion implantation of silver ions at 60 keV into silicate glass produces metallic colloids. Colloid growth during implantation was recorded by in situ changes in optical reflectivity. Post implant analyses included optical absorption, Rutherford backscattering and transmission electron microscopy. The optical data imply there is a range of colloid sizes and the details of colloid size as a function of depth are determined by the TEM measurements of thinned samples. The factors influencing the changes in the optical data with ion dose and the depth dependence of the colloid size distribution are discussed.

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页码：217 / 224

页数：8

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