ADSORPTION OF NITROGEN-ATOMS ON CU(111), RH(111) AND PT(110) SURFACES

被引:29
作者
BERKO, A [1 ]
SOLYMOSI, F [1 ]
机构
[1] ATTILA JOZSEF UNIV,INST SOLID STATE & RADIOCHEM,H-6701 SZEGED,HUNGARY
关键词
D O I
10.1016/0169-4332(92)90110-J
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption of N2 and atomic nitrogen generated in a high-frequency discharge has been investigated on Cu(111), Rh(111) and Pt(110) surfaces with LEED, AES and TDS methods. No adsorption and dissociation of N2 was experienced at 300-600 K under UHV conditions. However, a significant nitrogen adsorption occurred on all surfaces when the N2 gas was atomized by a high-frequency discharge. The concentration of adsorbed N generally 'attained half of the monolayer of surface, metal atoms. Adsorbed nitrogen formed a strong bond with metal surfaces: it desorbed in two stages. The peak temperatures were: 429 and 690-550 K for Rh(111), 467 and 523 K for Pt(110), and 620-677 and 768 K for Cu(111) surfaces. Adsorption of N atoms produced an ordered (2 x 2) LEED pattern (at low coverage) only on Pt surface. At higher coverage, it induced a (1 x 2) --> (1 x 1) change in the periodicity of the reconstructed Pt(110) surface.
引用
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页码:193 / 202
页数:10
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