TOTAL-ELECTRON-YIELD CURRENT MEASUREMENTS FOR NEAR-SURFACE EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE

被引：240

作者：

ERBIL, A ^{[1
]}

CARGILL, GS ^{[1
]}

FRAHM, R ^{[1
]}

BOEHME, RF ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHYSICAL REVIEW B | 1988年 / 37卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.37.2450

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：2450 / 2464

页数：15

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