A COMPLETE DESCRIPTION OF THE DISPERSION-RELATION FOR THIN METAL-FILM PLASMON-POLARITONS

被引:27
作者
BURTON, FA
CASSIDY, SA
机构
[1] British Telecom Research Laboratories, Martlesham Heath, Ipswich, Suffolk
关键词
D O I
10.1109/50.62881
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 [电气工程]; 0809 [电子科学与技术];
摘要
A versatile numerical method is used to solve the plasmonpolariton dispersion relation for a planar thin metal film geometry. A complete description of the variation of effective-mode index and propagation length with metal thickness and cover index is presented for all four modes. The spatial distribution of these modes is calculated explicitly. The effect of a nonideal metal film and of dielectric loss in the cover material is considered.
引用
收藏
页码:1843 / 1849
页数:7
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