BIAS SPUTTERING - ITS TECHNIQUES AND APPLICATIONS

被引：11

作者：

SEEMAN, JM

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(67)93141-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：129 / &

共 34 条

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[3] FINNEGAN JJ, 1964, 11 T AVS NAT VAC S
[4] FOWLER P, 1961, J APPL PHYS, V34, P3538
[5] FRANCOMBE MH, 1963, 10 T NAT VAC S, P316
[6] PROPERTIES OF SUPERCONDUCTING NIOBIUM FILMS MADE BY ASYMMETRIC AC SPUTTERING
FRERICHS, R
KIRCHER, CJ
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (12) : 3541 - &
[7] SUPERCONDUCTIVE FILMS MADE BY PROTECTED SPUTTERING OF TANTALUM OR NIOBIUM
FRERICHS, R
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (05) : 1898 - &
[8] FRERICHS R, 1962, J APPL PHYS, V33, P1899
[9] GERSTENBERG D, 1964, BELL LABORATORIES RE, P365
[10] ION TRAPPING AND GAS RELEASE PHENOMENA
GRANT, WA
CARTER, G
[J]. VACUUM, 1965, 15 (10) : 477 - &