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METAL DECORATION OF SURFACE DEFECT STRUCTURE ON THIN ANODIC TIO2 FILMS
被引:15
作者
:
PAIK, CH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
PAIK, CH
[
1
]
KOZLOWSKI, MR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
KOZLOWSKI, MR
[
1
]
TYLER, PS
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
TYLER, PS
[
1
]
SMYRL, WH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
SMYRL, WH
[
1
]
机构
:
[1]
UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1988年
/ 135卷
/ 09期
关键词
:
D O I
:
10.1149/1.2096283
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
19
引用
收藏
页码:2395 / 2396
页数:2
相关论文
共 18 条
[1]
DUNN WW, 1981, NOUV J CHIM, V5, P651
[2]
PHOTOELECTRONIC PROCESSES IN RUTILE
GHOSH, AK
论文数:
0
引用数:
0
h-index:
0
机构:
Itek Corporation, Lexington
GHOSH, AK
WAKIM, FG
论文数:
0
引用数:
0
h-index:
0
机构:
Itek Corporation, Lexington
WAKIM, FG
ADDISS, RR
论文数:
0
引用数:
0
h-index:
0
机构:
Itek Corporation, Lexington
ADDISS, RR
[J].
PHYSICAL REVIEW,
1969,
184
(03):
: 979
-
&
[3]
Graetzel M., 1983, ENERGY RESOURCES PHO
[4]
PHOTOELECTROCHROMIC CHARACTERISTICS OF PHOTOELECTROCHEMICAL IMAGING-SYSTEM WITH A SEMICONDUCTOR-SOLUTION (METALLIC ION) JUNCTION
INOUE, T
论文数:
0
引用数:
0
h-index:
0
INOUE, T
FUJISHIMA, A
论文数:
0
引用数:
0
h-index:
0
FUJISHIMA, A
HONDA, K
论文数:
0
引用数:
0
h-index:
0
HONDA, K
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(07)
: 1582
-
1588
[5]
PHOTOCHEMICAL NUCLEATION AND GROWTH OF PD ON TIO2 FILMS STUDIED WITH ELECTRON-MICROSCOPY AND QUANTITATIVE ANALYTICAL TECHNIQUES
JACOBS, JWM
论文数:
0
引用数:
0
h-index:
0
JACOBS, JWM
[J].
JOURNAL OF PHYSICAL CHEMISTRY,
1986,
90
(24)
: 6507
-
6517
[6]
NUCLEATION REACTION ON PHOTOSENSITIVE TIO2 FILMS
KELLY, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
KELLY, JJ
VONDELING, JK
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
VONDELING, JK
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(08)
: 1103
-
1107
[7]
EFFECTIVE SURFACES OF SEMICONDUCTOR CATALYSTS FOR LIGHT-INDUCED HETEROGENEOUS REACTIONS EVALUATED BY SIMULTANEOUS PHOTODEPOSITION OF BOTH OXIDATION AND REDUCTION PRODUCTS
KOBAYASHI, T
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
KOBAYASHI, T
TANIGUCHI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
TANIGUCHI, Y
YONEYAMA, H
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
YONEYAMA, H
TAMURA, H
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
TAMURA, H
[J].
JOURNAL OF PHYSICAL CHEMISTRY,
1983,
87
(05)
: 768
-
775
[8]
PHOTOELECTROCHEMICAL MICROSCOPY OF OXIDE-FILMS ON METALS - TI/TIO2 INTERFACE
KOZLOWSKI, MR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
KOZLOWSKI, MR
TYLER, PS
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
TYLER, PS
SMYRL, WH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
SMYRL, WH
ATANASOSKI, RT
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
ATANASOSKI, RT
[J].
SURFACE SCIENCE,
1988,
194
(03)
: 505
-
530
[9]
KOZLOWSKI MR, 1987, IN PRESS 172ND M EL
[10]
KOZLOWSKI MR, 1987, ELECTRODE MATERIALS
←
1
2
→
共 18 条
[1]
DUNN WW, 1981, NOUV J CHIM, V5, P651
[2]
PHOTOELECTRONIC PROCESSES IN RUTILE
GHOSH, AK
论文数:
0
引用数:
0
h-index:
0
机构:
Itek Corporation, Lexington
GHOSH, AK
WAKIM, FG
论文数:
0
引用数:
0
h-index:
0
机构:
Itek Corporation, Lexington
WAKIM, FG
ADDISS, RR
论文数:
0
引用数:
0
h-index:
0
机构:
Itek Corporation, Lexington
ADDISS, RR
[J].
PHYSICAL REVIEW,
1969,
184
(03):
: 979
-
&
[3]
Graetzel M., 1983, ENERGY RESOURCES PHO
[4]
PHOTOELECTROCHROMIC CHARACTERISTICS OF PHOTOELECTROCHEMICAL IMAGING-SYSTEM WITH A SEMICONDUCTOR-SOLUTION (METALLIC ION) JUNCTION
INOUE, T
论文数:
0
引用数:
0
h-index:
0
INOUE, T
FUJISHIMA, A
论文数:
0
引用数:
0
h-index:
0
FUJISHIMA, A
HONDA, K
论文数:
0
引用数:
0
h-index:
0
HONDA, K
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(07)
: 1582
-
1588
[5]
PHOTOCHEMICAL NUCLEATION AND GROWTH OF PD ON TIO2 FILMS STUDIED WITH ELECTRON-MICROSCOPY AND QUANTITATIVE ANALYTICAL TECHNIQUES
JACOBS, JWM
论文数:
0
引用数:
0
h-index:
0
JACOBS, JWM
[J].
JOURNAL OF PHYSICAL CHEMISTRY,
1986,
90
(24)
: 6507
-
6517
[6]
NUCLEATION REACTION ON PHOTOSENSITIVE TIO2 FILMS
KELLY, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
KELLY, JJ
VONDELING, JK
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
VONDELING, JK
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(08)
: 1103
-
1107
[7]
EFFECTIVE SURFACES OF SEMICONDUCTOR CATALYSTS FOR LIGHT-INDUCED HETEROGENEOUS REACTIONS EVALUATED BY SIMULTANEOUS PHOTODEPOSITION OF BOTH OXIDATION AND REDUCTION PRODUCTS
KOBAYASHI, T
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
KOBAYASHI, T
TANIGUCHI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
TANIGUCHI, Y
YONEYAMA, H
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
YONEYAMA, H
TAMURA, H
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN
TAMURA, H
[J].
JOURNAL OF PHYSICAL CHEMISTRY,
1983,
87
(05)
: 768
-
775
[8]
PHOTOELECTROCHEMICAL MICROSCOPY OF OXIDE-FILMS ON METALS - TI/TIO2 INTERFACE
KOZLOWSKI, MR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
KOZLOWSKI, MR
TYLER, PS
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
TYLER, PS
SMYRL, WH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
SMYRL, WH
ATANASOSKI, RT
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
ATANASOSKI, RT
[J].
SURFACE SCIENCE,
1988,
194
(03)
: 505
-
530
[9]
KOZLOWSKI MR, 1987, IN PRESS 172ND M EL
[10]
KOZLOWSKI MR, 1987, ELECTRODE MATERIALS
←
1
2
→