APPLICATION OF HIGH-RESOLUTION RUTHERFORD BACKSCATTERING TO MEASUREMENT OF ION RANGES IN SI AND A1

被引：25

作者：

WILLIAMS, JS ^{[1
]}

GRANT, WA ^{[1
]}

机构：

[1] UNIV SALFORD,DEPT ELECT ENGN,SALFORD M5 4WT,LANCASHIRE,ENGLAND

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1975年 / 25卷 / 01期

关键词：

D O I：

10.1080/00337577508242056

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：55 / 56

页数：2

共 10 条

[1] DEFECT STUDIES IN CRYSTALS BY MEANS OF CHANNELING
BOGH, E
[J]. CANADIAN JOURNAL OF PHYSICS, 1968, 46 (06) : 653 - &
[2] DEARNALEY G, 1974, ANN REV MATER SCI, V4
[3] JOHNSON WS, 1969, PROJECTED RANGE STAT
[4] Lindhard J., 1963, MAT FYS MEDD K DAN V, V33, P14
[5] HEAVY-ION RANGES AT 100 KEV IN ALUMINUM
NEILSON, GW
FARMERY, BW
THOMPSON, MW
[J]. PHYSICS LETTERS A, 1973, A 46 (01) : 45 - 46
[6] METALLURGICAL APPLICATIONS OF ION-IMPLANTATION AND ION-BOMBARDMENT
NELSON, RS
[J]. VACUUM, 1973, 23 (03) : 79 - 84
[7] PICRAUX ST, 1974, APPLICATIONS ION BEA
[8] WHITTON JL, 1973, CHANNELLING THEORY O
[9] Williams J. S., 1974, Radiation Effects, V22, P211, DOI 10.1080/10420157408230783
[10] WILLIAMS JF, TO BE PUBLISHED