FABRICATION OF AU NANOPARTICLES BY RADIOFREQUENCY MAGNETRON SPUTTERING

被引:24
作者
TERAUCHI, S
KOSHIZAKI, N
UMEHARA, H
机构
[1] National Institute of Materials and Chemical Research, Agency of Industrial Science and Technology, Tsukuba, Ibaraki, 305
来源
NANOSTRUCTURED MATERIALS | 1995年 / 5卷 / 01期
关键词
D O I
10.1016/0965-9773(95)00011-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated the evolution of the size and the morphology of Au nanoparticles fabricated by rf magnetron sputtering techniques at room temperature as a function of sputtering gas pressure, p; rf, input power, L; and sputtering rime, t. For 60 less than or equal to p less than or equal to 300 mTorr, Au nanoparticles were deposited. For 60 less than or equal to p less than or equal to 250 mTorr, the particle size increased with increasing Land extending t. On increasing L and t further, film formation occurred. When p = 300 mTorr, nanoparticles formed at L = 200 W.
引用
收藏
页码:71 / 78
页数:8
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