THE CONCEPT OF 2 MOBILITIES IN HOMOEPITAXIAL GROWTH

被引:39
作者
ROSENFELD, G [1 ]
POELSEMA, B [1 ]
COMSA, G [1 ]
机构
[1] UNIV TWENTE, FAC TECH NATUURKUNDE, 7500 AE ENSCHEDE, NETHERLANDS
关键词
D O I
10.1016/0022-0248(95)00077-1
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A general kinetic concept is introduced which can be used to control growth modes in homoepitaxy. Its basic idea is that during growth of a layer, the characteristic length scale associated with nucleation is deliberately varied. The power of this concept lies in the fact that it can be realized experimentally in a variety of ways and is not restricted to special systems. It helps to understand various effects reported in the literature and may serve as a guideline for future methods of growth manipulation.
引用
收藏
页码:230 / 233
页数:4
相关论文
共 13 条
[1]  
Ehrlich, Hudda, J. Chem. Phys., 44, (1966)
[2]  
Schwoebel, Shipsey, J. Appl. Phys., 37, (1966)
[3]  
Kunkel, Poelsema, Verheij, Comsa, Phys. Rev. Letters, 65, (1990)
[4]  
Rosenfeld, Servaty, Teichert, Poelsema, Comsa, Phys. Rev. Letters, 71, (1993)
[5]  
Markov, Pchelyakov, Sokolov, Stenin, Stoyanov, Surface Sci., 250, (1991)
[6]  
Greene, Barnett, Sundgren, Rockett, Ion Beam Assisted Film Growth, (1989)
[7]  
Hirvonen, Mater. Sci. Rept., 6, (1991)
[8]  
Snyder, Orr, Phys. Rev. Letters, 70, (1993)
[9]  
Voigtlander, Zinner, Influence of surfactants on the growth-kinetics of Si on Si(111), Surface Science, 292, (1993)
[10]  
Oppo, Fiorentini, Scheffler, Phys. Rev. Letters, 71, (1993)